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SPIE Proceedings [SPIE Second International Symposium on Laser Precision Micromachining - Singapore, Singapore (Wednesday 16 May 2001)] Second International Symposium on Laser Precision Microfabrication - <title>High-resolution 157-nm imaging for lithography and micromachining applications</title>

SPIE Proceedings [SPIE Second International Symposium on Laser Precision Micromachining - Singapore, Singapore (Wednesday 16 May 2001)] Second International Symposium on Laser Precision Microfabrication - High-resolution 157-nm imaging for lithography and micromachining applications

Gower, Malcolm C.; Cashmore, Julian S.; Whitfield, Michael D.; Gruenewald, Philipp; Miyamoto, Isamu; Lu, Yong Feng; Sugioka, Koji; Dubowski, Jan J.
  • 作者Gower, Malcolm C.; Cashmore, Julian S.; Whitfield, Michael D.; Gruenewald, Philipp; Miyamoto, Isamu; Lu, Yong Feng; Sugioka, Koji; Dubowski, Jan J.
  • 卷第4426卷
  • 印刷ISSN0277-786X
  • 文件大小1193.56KB
  • 发表时间2002
  • DOI10.1117/12.456887
  • 页码401-407
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