Performance of ArF Resist Process for 100nm DRAM Full Chip.
- 期刊名称Journal of Photopolymer Science and Technology
- 作者Shin, Ki-Soo; Kim, Hyeong Soo; Jung, Jae Chang
- 卷第15卷
- 期第3期
- 印刷ISSN0914-9244
- 电子ISSN1349-6336
- 文件大小1809.32KB
- 发表时间2002
- DOI10.2494/photopolymer.15.441
- 页码441-446