Application of VEMA type ArF Resist to Sub-100nm Lithography.

• 期刊名称Journal of Photopolymer Science and Technology
• 作者Kim, Hyun-Woo; Lee, Sook; Choi, Sang-Jun; Woo, Sang-Gyun; Chae, Yun-Sook; Kim, Jisoo; Moon, Joo-Tae; Kavanagh, Robert; Barclay, George
• 卷第15卷
• 期第3期
• 印刷ISSN0914-9244
• 电子ISSN1349-6336
• 文件大小1024.20KB
• 发表时间2002
• DOI10.2494/photopolymer.15.529
• 页码529-534