Low-temperature crystallization of amorphous Si films using AlCl3 vapor
Jin Hyung Ahn; Ji Hye Eom; Kyung Hoon Yoon; Byung Tae Ahn
- 作者Jin Hyung Ahn; Ji Hye Eom; Kyung Hoon Yoon; Byung Tae Ahn
- 卷第74卷
- 印刷ISSN0927-0248
- 文件大小226.85KB
- 发表时间2002
- DOI10.1016/s0927-0248(02)00090-9
- 页码315-321