Plasma Etch Processes for Embedded FRAM Integration
- 期刊名称Integrated Ferroelectrics
- 作者Celii, Francis G.; Thakre, Mahesh; Gay, Mark K.; Summerfelt, Scott R.; Aggarwal, Sanjeev; Martin, J. Scott; Hall, Lindsey; Udayakumar, K. R.; Moise, Ted S.
- 卷第53卷
- 期第1期
- 印刷ISSN1058-4587
- 电子ISSN1607-8489
- 文件大小490.61KB
- 发表时间2003-03
- DOI10.1080/10584580390258183
- 页码269-277
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