[IEEE IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop - Munich, Germany (31 March-1 April 2003)] Advanced Semiconductor Manufacturing Conference and Workshop, 2003 IEEEI/SEMI - Dopant redistribution and loss during ternary silicide Co/sub x/Ni/sub 1-x/Si/sub 2/ formation
- 作者Xu, Y.Q.; Zhao, J.; Lu, J.P.; Miles, D.; Loewecke, J.; Tiner, P.; Xia Dong, ; Novak, S.W.
- 文件大小225.34KB
- 发表时间2003
- DOI10.1109/ASMC.2003.1194489
- 页码171-174
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