High rate etching of GaAs and GaP by gas cluster ion beams
- 期刊名称MRS Proceedings
- 作者Nagano, Masahiro; Houzumi, Shingo; Toyoda, Noriaki; Yamada, Susumu; Akita, Shirabe; Yamada, Isao
- 卷第792卷
- 电子ISSN1946-4274
- 文件大小250.82KB
- 发表时间2003-1
- DOI10.1557/PROC-792-R9.38
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