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Comparison of the thermal stabilities of NiSi films in Ni/Si, Ni/Pd/Si and Ni/Pt/Si systems

Comparison of the thermal stabilities of NiSi films in Ni/Si, Ni/Pd/Si and Ni/Pt/Si systems

Wang, R N; Feng, J Y

期刊名称Journal of Physics: Condensed Matter
作者Wang, R N; Feng, J Y
卷第15卷
期第12期
印刷ISSN0953-8984
文件大小135.32KB
发表时间2003-04-02
DOI10.1088/0953-8984/15/12/310
页码1935-1942

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