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Growth and electrical properties of ZnO thin films deposited by novel ion plating method

Growth and electrical properties of ZnO thin films deposited by novel ion plating method

K. Iwata; T. Sakemi; A. Yamada; P. Fons; K. Awai; T. Yamamoto; M. Matsubara; H. Tampo; S. Niki
  • 作者K. Iwata; T. Sakemi; A. Yamada; P. Fons; K. Awai; T. Yamamoto; M. Matsubara; H. Tampo; S. Niki
  • 卷第445卷
  • 期第2期
  • 印刷ISSN0040-6090
  • 文件大小194.26KB
  • 发表时间2003
  • DOI10.1016/s0040-6090(03)01160-x
  • 页码274-277
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