Similarities in the electrical conduction processes in hydrogenated amorphous silicon oxynitride and silicon nitride
H. Kato; H. Sato; Y. Ohki; K. S. Seol; T. Noma
- 作者H. Kato; H. Sato; Y. Ohki; K. S. Seol; T. Noma
- 文件大小122.32KB
- 发表时间2003
- DOI10.1088/0953-8984/15/13/305