Epitaxial silicon films deposited at high rates by gas-jet electron beam plasma CVD

R.G. Sharafutdinov; V.M. Karsten; S.Ya. Khmel; A.G. Cherkov; A.K. Gutakovskii; L.D. Pokrovsky; O.I. Semenova

作者R.G. Sharafutdinov; V.M. Karsten; S.Ya. Khmel; A.G. Cherkov; A.K. Gutakovskii; L.D. Pokrovsky; O.I. Semenova
印刷ISSN0257-8972
文件大小657.96KB
发表时间2003
DOI10.1016/s0257-8972(03)00452-3
页码1178-1181

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