The interaction of boron and phosphorus with dislocations in silicon

• 作者Hans Siethoff; Hans Georg Brion
• 卷第355卷
• 印刷ISSN0921-5093
• 文件大小181.54KB
• 发表时间2003
• DOI10.1016/s0921-5093(03)00083-2
• 页码311-314