SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Pattern inspection of EUV mask using an EUV microscope
Watanabe, Takeo; Tanabe, Hiroyoshi; Haga, Tsuneyuki; Shoki, Tsutomu; Hamamoto, Kazuhiro; Takada, Shintaro; Kazui, Naoki; Kakunai, Satoshi; Tsubakino, Harushige; Kinoshita, Hiroo
- 作者Watanabe, Takeo; Tanabe, Hiroyoshi; Haga, Tsuneyuki; Shoki, Tsutomu; Hamamoto, Kazuhiro; Takada, Shintaro; Kazui, Naoki; Kakunai, Satoshi; Tsubakino, Harushige; Kinoshita, Hiroo
- 卷第5130卷
- 印刷ISSN0277-786X
- 文件大小1339.11KB
- 发表时间2003
- DOI10.1117/12.504240