Ion-beam induced defects and nanoscale amorphous clusters in silicon carbide
W.J Weber; F Gao; R Devanathan; W Jiang; C.M Wang
- 作者W.J Weber; F Gao; R Devanathan; W Jiang; C.M Wang
- 卷第216卷
- 印刷ISSN0168-583X
- 文件大小577.37KB
- 发表时间2004
- DOI10.1016/j.nimb.2003.11.016
- 页码25-35