Effects of negative low substrate bias voltage on the structure and properties of fluorinated amorphous carbon films synthesized by plasma immersion ion implantation and deposition
- 期刊名称Surface and Coatings Technology
- 作者YAO, Z
- 印刷ISSN0257-8972
- 文件大小531.55KB
- 发表时间2004-05
- DOI10.1016/S0257-8972(04)00242-7