Ar plasma irradiation effects in atomically controlled Si epitaxial growth
Daisuke Muto; Masao Sakuraba; Takuya Seino; Junichi Murota
- 作者Daisuke Muto; Masao Sakuraba; Takuya Seino; Junichi Murota
- 卷第224卷
- 印刷ISSN0169-4332
- 文件大小151.25KB
- 发表时间2004
- DOI10.1016/j.apsusc.2003.08.048
- 页码210-214