[IEEE Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004. - Honolulu, HI, USA (2004.06.17-2004.06.17)] Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004. - Development of highly robust nano-mixed Hf/sub x/Al/sub y/O/sub z/ dielectrics for TiN/Hf/sub x/Al/sub y/O/sub z//TiN capacitor applicable to 65nm generation DRAMs

Deok-Sin Kil, ; Kwon Hong, ; Kee-Jeung Lee, ; Joosung Kim, ; Han-Sang Song, ; Ki-Seon Park, ; Jae-Sung Roh, ; Hyun-Chul Sohn, ; Jin-Woong Kim, ; Sung-Wook Park,

作者Deok-Sin Kil, ; Kwon Hong, ; Kee-Jeung Lee, ; Joosung Kim, ; Han-Sang Song, ; Ki-Seon Park, ; Jae-Sung Roh, ; Hyun-Chul Sohn, ; Jin-Woong Kim, ; Sung-Wook Park,
文件大小215.24KB
发表时间2004
DOI10.1109/vlsit.2004.1345432
页码126-127

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