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Properties of C[sub 4]F[sub 8] inductively coupled plasmas. I. Studies of Ar/c-C[sub 4]F[sub 8] magnetically confined plasmas for etching of SiO[sub 2]

Properties of C[sub 4]F[sub 8] inductively coupled plasmas. I. Studies of Ar/c-C[sub 4]F[sub 8] magnetically confined plasmas for etching of SiO[sub 2]

Li, Xi; Ling, Li; Hua, Xuefeng; Oehrlein, Gottlieb S.; Wang, Yicheng; Vasenkov, Alex V.; Kushner, Mark J.
  • 期刊名称Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
  • 作者Li, Xi; Ling, Li; Hua, Xuefeng; Oehrlein, Gottlieb S.; Wang, Yicheng; Vasenkov, Alex V.; Kushner, Mark J.
  • 卷第22卷
  • 期第3期
  • 印刷ISSN0734-2101
  • 文件大小770.95KB
  • 发表时间2004
  • DOI10.1116/1.1697482
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