Co-sputtering phenomenon in plasma immersion ion implantation of samples for semiconductor applications

• 作者Rajkumar; Mukesh Kumar; S Mukherjee; Sanjay Verma; K.S Chari; D.N Singh; P.J George
• 卷第186卷
• 印刷ISSN0257-8972
• 文件大小587.22KB
• 发表时间2004
• DOI10.1016/j.surfcoat.2004.04.012
• 页码62-67