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Effects of negative low substrate bias voltage on the structure and properties of fluorinated amorphous carbon films synthesized by plasma immersion ion implantation and deposition

Effects of negative low substrate bias voltage on the structure and properties of fluorinated amorphous carbon films synthesized by plasma immersion ion implantation and deposition

Z.Q Yao; P Yang; N Huang; H Sun; J Wang

作者Z.Q Yao; P Yang; N Huang; H Sun; J Wang
卷第186卷
印刷ISSN0257-8972
文件大小531.55KB
发表时间2004
DOI10.1016/j.surfcoat.2004.04.038
页码131-135

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