Formation of thin β-FeSi2 template layer for the epitaxial growth of thick film on Si (111) substrate
Ryo Kuroda; Zhengxin Liu; Yasuhiro Fukuzawa; Yasuhito Suzuki; Masato Osamura; Shinan Wang; Naotaka Otogawa; Teruhisa Ootsuka; Takahiro Mise; Yasushi Hoshino; Yasuhiko Nakayama; Hisao Tanoue; Yunosuke Makita
- 作者Ryo Kuroda; Zhengxin Liu; Yasuhiro Fukuzawa; Yasuhito Suzuki; Masato Osamura; Shinan Wang; Naotaka Otogawa; Teruhisa Ootsuka; Takahiro Mise; Yasushi Hoshino; Yasuhiko Nakayama; Hisao Tanoue; Yunosuke Makita
- 卷第461卷
- 期第1期
- 印刷ISSN0040-6090
- 文件大小1031.05KB
- 发表时间2004
- DOI10.1016/j.tsf.2004.02.055
- 页码34-39