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Secondary defect formation in bonded silicon-on-insulator after boron implantation

Secondary defect formation in bonded silicon-on-insulator after boron implantation

A. F. Saavedra; A. C. King; K. S. Jones; E. C. Jones; K. K. Chan

作者A. F. Saavedra; A. C. King; K. S. Jones; E. C. Jones; K. K. Chan
文件大小598.60KB
发表时间2004
DOI10.1116/1.1640656

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