SPIE Proceedings [SPIE Optical Science and Technology, SPIE's 48th Annual Meeting - San Diego, CA (Sunday 3 August 2003)] Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications - Fabrication and metrology of diffraction limited soft x-ray optics for the EUV microlithography
Dinger, Udo; Seitz, Guenther; Schulte, Stefan; Eisert, Frank; Muenster, Christian; Burkart, Stefan; Stacklies, Siegfried; Bustaus, Christian; Hoefer, Hubert; Mayer, Maximilian; Fellner, Bernhard; Hocky, Oliver; Rupp, Markus; Riedelsheimer, Klaus; Kuerz, Peter; Khounsary, Ali M.; Dinger, Udo; Ota, Kazuya
- 作者Dinger, Udo; Seitz, Guenther; Schulte, Stefan; Eisert, Frank; Muenster, Christian; Burkart, Stefan; Stacklies, Siegfried; Bustaus, Christian; Hoefer, Hubert; Mayer, Maximilian; Fellner, Bernhard; Hocky, Oliver; Rupp, Markus; Riedelsheimer, Klaus; Kuerz, Peter; Khounsary, Ali M.; Dinger, Udo; Ota, Kazuya
- 卷第5193卷
- 印刷ISSN0277-786X
- 文件大小701.91KB
- 发表时间2004
- DOI10.1117/12.511489
- 页码18-28