SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - Reduction of radial CD errors and Cr loading effects in 90-nm binary NCAR mask process through chrome etch DOE
Ma, Jian; Li, Chaoyang; Bassist, Larry; Pekney, Matthew; Wilcox, Nathan; Farnsworth, Jeff; Lauder, Edward; Krishnakumar, B.; Staud, Wolfgang; Weed, J. Tracy
- 作者Ma, Jian; Li, Chaoyang; Bassist, Larry; Pekney, Matthew; Wilcox, Nathan; Farnsworth, Jeff; Lauder, Edward; Krishnakumar, B.; Staud, Wolfgang; Weed, J. Tracy
- 卷第5567卷
- 印刷ISSN0277-786X
- 文件大小1538.03KB
- 发表时间2004
- DOI10.1117/12.568423
- 页码167-175