SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - The study of phase angle effects to wafer process window using 193-nm EAPSM in a 300-mm wafer manufacturing environment
Chou, William Y.; Tanabe, Hiroyoshi; Yen, Shih M.; Wu, J. K.; Shieh, W. B.; Chuang, Mars; Fan, George; Tseng, Chin Chih; Hughes, Gregory P.; MacDonald, Susan S.; Holiday, Carrie; Chen, Gong
- 作者Chou, William Y.; Tanabe, Hiroyoshi; Yen, Shih M.; Wu, J. K.; Shieh, W. B.; Chuang, Mars; Fan, George; Tseng, Chin Chih; Hughes, Gregory P.; MacDonald, Susan S.; Holiday, Carrie; Chen, Gong
- 卷第5446卷
- 印刷ISSN0277-786X
- 文件大小270.39KB
- 发表时间2004
- DOI10.1117/12.557754