SPIE Proceedings [SPIE 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Dresden, Germany (Monday 12 January 2004)] 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Metrological characterization of new CD photomask standards
Mirande, Werner; Bodermann, Bernd; Haessler-Grohne, W.; Frase, Carl G.; Czerkas, Slawomir; Bosse, Harald
- 作者Mirande, Werner; Bodermann, Bernd; Haessler-Grohne, W.; Frase, Carl G.; Czerkas, Slawomir; Bosse, Harald
- 卷第5504卷
- 印刷ISSN0277-786X
- 文件大小347.39KB
- 发表时间2004
- DOI10.1117/12.568020