Electron Dynamics in Chemically Amplified Resists
Kozawa, Takahiro; Yamamoto, Hiroki; Nakano, Atsuko; Saeki, Akinori; Okamoto, kazumasa; Tagawa, Seiichi
- 期刊名称Journal of Photopolymer Science and Technology
- 作者Kozawa, Takahiro; Yamamoto, Hiroki; Nakano, Atsuko; Saeki, Akinori; Okamoto, kazumasa; Tagawa, Seiichi
- 卷第17卷
- 期第3期
- 印刷ISSN0914-9244
- 电子ISSN1349-6336
- 文件大小302.34KB
- 发表时间2004
- DOI10.2494/photopolymer.17.449
- 页码449-452