Optical band gaps and composition dependence of hafnium–aluminate thin films grown by atomic layer chemical vapor deposition

Nguyen, N. V.; Sayan, S.; Levin, I.; Ehrstein, J. R.; Baumvol, I. J. R.; Driemeier, C.; Krug, C.; Wielunski, L.; Hung, P. Y.; Diebold, Alain

作者Nguyen, N. V.; Sayan, S.; Levin, I.; Ehrstein, J. R.; Baumvol, I. J. R.; Driemeier, C.; Krug, C.; Wielunski, L.; Hung, P. Y.; Diebold, Alain
卷第23卷
期第6期
文件大小512.61KB
发表时间2005
DOI10.1116/1.2091096

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