Remediation for TXRF saturation effects on microdroplet residues from preconcentration methods on semiconductor wafers
- 期刊名称Journal of Analytical Atomic Spectrometry
- 作者Hellin, D.; Rip, J.; Geens, V.; Delande, T.; Conard, T.; De Gendt, S.; Vinckier, C.
- 卷第20卷
- 期第7期
- 印刷ISSN0267-9477
- 电子ISSN1364-5544
- 文件大小745.80KB
- 发表时间2005
- DOI10.1039/b502208h
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