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Achieving area-selective atomic layer deposition on patterned substrates by selective surface modification

Achieving area-selective atomic layer deposition on patterned substrates by selective surface modification

Chen, Rong; Kim, Hyoungsub; McIntyre, Paul C.; Porter, David W.; Bent, Stacey F.

期刊名称Applied Physics Letters
作者Chen, Rong; Kim, Hyoungsub; McIntyre, Paul C.; Porter, David W.; Bent, Stacey F.
卷第86卷
期第19期
印刷ISSN0003-6951
文件大小582.32KB
发表时间2005
DOI10.1063/1.1922076

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