Robust Si wafer
- 作者Xinming Huang; Tsuyoshi. Sato; Masami Nakanishi; Toshinori Taishi; Keigo Hoshikawa; Satoshi Uda
- 卷第275卷
- 印刷ISSN0022-0248
- 文件大小268.96KB
- 发表时间2005
- DOI10.1016/j.jcrysgro.2004.11.010
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