Behavior of the edge dislocation propagating along the growth direction in Czochralski Si crystal growth

• 作者Toshinori Taishi; Xinming Huang; Ichiro Yonenaga; Keigo Hoshikawa
• 卷第275卷
• 印刷ISSN0022-0248
• 文件大小347.68KB
• 发表时间2005
• DOI10.1016/j.jcrysgro.2004.11.287