MOCVD growth and properties of ZnO thin films on LiNbO3 substrates
- 作者Yinzhen Wang; Haili Wang; Shiliang Liu; Hongxia Liu; Shengming Zhou; Yin Hang; Jun Xu; Jiandong Ye; Shulin Gu; Rong Zhang
- 卷第277卷
- 印刷ISSN0022-0248
- 文件大小187.98KB
- 发表时间2005
- DOI10.1016/j.jcrysgro.2005.01.069
- 页码378-381
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