Effect of plasma interactions with low-κ films as a function of porosity, plasma chemistry, and temperature

Worsley, Marcus A.; Bent, Stacey F.; Gates, Stephen M.; Fuller, Nicholas C. M.; Volksen, Willi; Steen, Michelle; Dalton, Timothy

期刊名称Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
作者Worsley, Marcus A.; Bent, Stacey F.; Gates, Stephen M.; Fuller, Nicholas C. M.; Volksen, Willi; Steen, Michelle; Dalton, Timothy
卷第23卷
期第2期
印刷ISSN0734-211X
文件大小700.11KB
发表时间2005
DOI10.1116/1.1861038

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