Synchrotron radiation-excited etching of ZnTe using Ar gas
- 作者Tooru Tanaka; Yusuke Kume; Kazuki Hayashida; Katsuhiko Saito; Mitsuhiro Nishio; Qixin Guo; Hiroshi Ogawa
- 卷第238卷
- 印刷ISSN0168-583X
- 文件大小191.13KB
- 发表时间2005
- DOI10.1016/j.nimb.2005.06.029
- 页码115-118