Chemical structure of silicon-, oxygen- and nitrogen-containing a-C:H films prepared by RF plasma beam CVD
- 作者A. Tóth; M. Mohai; T. Ujvári; I. Bertóti
- 卷第482卷
- 印刷ISSN0040-6090
- 文件大小253.75KB
- 发表时间2005
- DOI10.1016/j.tsf.2004.11.136
- 页码183-187
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