Variation of the deposition rate during ion beam sputter deposition of optical thin films

• 作者Hongxiang Liu; Shengming Xiong; Linghui Li; Yundong Zhang
• 卷第484卷
• 印刷ISSN0040-6090
• 文件大小156.34KB
• 发表时间2005
• DOI10.1016/j.tsf.2005.02.041
• 页码170-173