Solid state amorphization at the room temperature deposited Ni∕Si(100) interface

• 作者J. Wen; L. Wang; C. Liu; H. Lee; J. Hwang; C. Ouyang; T. Pi; J. Hwang; C. Cheng
• 文件大小604.74KB
• 发表时间2005
• DOI10.1116/1.1990166