Reaction Mechanisms of Brominated Chemically Amplified Resists
- 期刊名称Japanese Journal of Applied Physics
- 作者Yamamoto, Hiroki; Kozawa, Takahiro; Nakano, Atsuro; Okamoto, Kazumasa; Tagawa, Seiichi; Ando, Tomoyuki; Sato, Mitsuru; Komano, Hiroji
- 卷第44卷
- 印刷ISSN0021-4922
- 文件大小898.40KB
- 发表时间2005-6-17
- DOI10.1143/JJAP.44.L842