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Evaluation of Performance of Proximity Effect Correction in Electron Projection Lithography

Evaluation of Performance of Proximity Effect Correction in Electron Projection Lithography

M. Osawa; K. Ogino; H. Hoshino; Y. Machida; F. Koba; H. Yamashita; H. Arimoto
  • 作者M. Osawa; K. Ogino; H. Hoshino; Y. Machida; F. Koba; H. Yamashita; H. Arimoto
  • 文件大小210.47KB
  • 发表时间2005
  • DOI10.1143/JJAP.44.5535
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