SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Simulations of immersion lithography
- 作者Bai, Min; Smith, Bruce W.; Lei, Junjiang; Zhang, Lin; Shiely, James P.
- 卷第5754卷
- 印刷ISSN0277-786X
- 文件大小80.64KB
- 发表时间2005
- DOI10.1117/12.601497
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