The effects of substrate bias, substrate temperature, and pulse frequency on the microstructures of chromium nitride coatings deposited by pulsed direct current reactive magnetron sputtering
- 作者Jyh-Wei Lee; Shih-Kang Tien; Yu-Chu Kuo
- 卷第34卷
- 期第12期
- 印刷ISSN0361-5235
- 电子ISSN1543-186X
- 文件大小721.43KB
- 发表时间2005
- DOI10.1007/s11664-005-0155-9
- 页码1484-1492