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[IEEE 13th International Symposium on the Physical and Failure Analysis of Integrated Circuits - Singapore (2006.7.3-2006.7.3)] 13th International Symposium on the Physical and Failure Analysis of Integrated Circuits - Effect of Wire Thickness on Electromigration and Stress Migration Lifetime of Cu

[IEEE 13th International Symposium on the Physical and Failure Analysis of Integrated Circuits - Singapore (2006.7.3-2006.7.3)] 13th International Symposium on the Physical and Failure Analysis of Integrated Circuits - Effect of Wire Thickness on Electromigration and Stress Migration Lifetime of Cu

Christiansen, Cathryn; Gambino, Jeff; Therrien, Joe; Hunt, Doug; Gill, Jason
  • 作者Christiansen, Cathryn; Gambino, Jeff; Therrien, Joe; Hunt, Doug; Gill, Jason
  • 文件大小5304.47KB
  • 发表时间2006
  • DOI10.1109/ipfa.2006.250985
  • 页码349-354
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