An optimal high contrast e-beam lithography process for the patterning of dense fin networks

• 作者F. Fruleux-Cornu; J. Penaud; E. Dubois; M. François; M. Muller
• 卷第26卷
• 印刷ISSN0928-4931
• 文件大小370.35KB
• 发表时间2006
• DOI10.1016/j.msec.2005.09.017
• 页码893-897