Effects of germanium and carbon coimplants on phosphorus diffusion in silicon
- 期刊名称Applied Physics Letters
- 作者Ku, K. C.; Nieh, C. F.; Gong, J.; Huang, L. P.; Sheu, Y. M.; Wang, C. C.; Chen, C. H.; Chang, H.; Wang, L. T.; Lee, T. L.; Chen, S. C.; Liang, M. S.
- 卷第89卷
- 期第11期
- 印刷ISSN0003-6951
- 文件大小452.39KB
- 发表时间2006
- DOI10.1063/1.2347896
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