Feature scale model of Si etching in SF[sub 6]∕O[sub 2]∕HBr plasma and comparison with experiments
- 期刊名称Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
- 作者Belen, Rodolfo Jun; Gomez, Sergi; Kiehlbauch, Mark; Aydil, Eray S.
- 卷第24卷
- 期第2期
- 印刷ISSN0734-2101
- 文件大小1006.47KB
- 发表时间2006
- DOI10.1116/1.2173268
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