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Stress Driven Rearrangement Instability of Crystalline Films with Electromechanical Interaction

Stress Driven Rearrangement Instability of Crystalline Films with Electromechanical Interaction

Chung, Peter; Clayton, John; Cole, Melanie M; Grinfeld, Michael; Grinfeld, Pavel; Nothwang, William
  • 期刊名称MRS Proceedings
  • 作者Chung, Peter; Clayton, John; Cole, Melanie M; Grinfeld, Michael; Grinfeld, Pavel; Nothwang, William
  • 卷第924卷
  • 电子ISSN1946-4274
  • 文件大小78.14KB
  • 发表时间2006-1
  • DOI10.1557/PROC-0924-Z07-04
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