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Investigation of oxygen annealing effects on RF sputter deposited SiC thin films

Investigation of oxygen annealing effects on RF sputter deposited SiC thin films

R.M. Todi; K.B. Sundaram; A.P. Warren; K. Scammon

作者R.M. Todi; K.B. Sundaram; A.P. Warren; K. Scammon
卷第50卷
印刷ISSN0038-1101
文件大小1317.15KB
发表时间2006
DOI10.1016/j.sse.2006.06.021
页码1189-1193

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