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Inductively coupled plasma etching of amorphous Al[sub 2]O[sub 3] and TiO[sub 2] mask layers grown by atomic layer deposition

Inductively coupled plasma etching of amorphous Al[sub 2]O[sub 3] and TiO[sub 2] mask layers grown by atomic layer deposition

J. Dekker; K. Kolari; R. L. Puurunen

作者J. Dekker; K. Kolari; R. L. Puurunen
文件大小693.69KB
发表时间2006
DOI10.1116/1.2353844

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