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Characterization of Argon Fast Atom Beam Source and Application to Mesa Etching Process for GaInP/GaAs Triple-Barrier Resonant Tunneling Diodes

Characterization of Argon Fast Atom Beam Source and Application to Mesa Etching Process for GaInP/GaAs Triple-Barrier Resonant Tunneling Diodes

Suhara, Michihiko; Matsuzaka, Norihiko; Fukumitsu, Masakazu; Okumura, Tsugunori
  • 期刊名称Japanese Journal of Applied Physics
  • 作者Suhara, Michihiko; Matsuzaka, Norihiko; Fukumitsu, Masakazu; Okumura, Tsugunori
  • 卷第45卷
  • 印刷ISSN0021-4922
  • 电子ISSN1347-4065
  • 文件大小174.95KB
  • 发表时间2006-6-20
  • DOI10.1143/JJAP.45.5504
  • 页码5504-5508
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